Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Patent
1998-01-12
2000-04-18
Gordon, Paul P.
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
700 47, 700 52, 700 74, 700109, 700115, 700129, 355 53, 355 55, 355 67, 355 71, 356401, G06F 1900, G06G 766
Patent
active
060526262
ABSTRACT:
The order of optical conditions and mask conditions necessary required in a photolithography process to be varied is designated so as to minimize the number of recalculations for a transmission cross-coefficient and a Fourier transform of a mask. The conditions are systemically varied and Fourier transforms of the mask and the transmission cross-coefficients are tabulated. With the resultant tables, the parametric analysis for calculating the light intensity distribution is performed.
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"Optical Technology Contact", vol. 28, No. 3, 1990 pp. 165-175 (with Translation).
Gordon Paul P.
NEC Corporation
Patel Ramesh
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