Hiroto Yukawa

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(Disulfonyl diazomethane compounds)

Organic compounds -- part of the class 532-570 series – Organic compounds – Diazo or diazonium
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Method for formation of patterned resist layer

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate

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Poly (disulfonyl diazomethane) compound and positive-working...

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate

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Positive resist composition and positive resist base...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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Positive-working chemical-amplification photoresist composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1639667

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