(Disulfonyl diazomethane compounds)

Details (Disulfonyl diazomethane compounds) (Disulfonyl diazomethane compounds)

1999-05-13

2000-11-28

Powers, Fiona T.

Organic compounds -- part of the class 532-570 series

Organic compounds

Diazo or diazonium

C07C24514

Patent

active

061537330

ABSTRACT:
Disclosed is a poly(disulfonyl diazomethane) compound as a class of novel compounds represented by the general formula ##STR1## in which the subscript n is 1 to 5, each R is a monovalent hydrocarbon group and Z is a divalent hydrocarbon group. The invention also discloses a chemical-amplification positive-working photoresist composition which comprises the above mentioned poly(disulfonyl diazomethane) compound as the radiation-sensitive acid-generating agent in combination with a film-forming resin capable of being imparted with increased solubility in an aqueous alkaline solution by the interaction with an acid, such as a polyhydroxystyrene resin of which a part of the hydroxyl groups are substituted by acid-dissociable solubility-reducing groups, e.g., tert-butoxycarbonyl groups.

REFERENCES:
patent: 3332936 (1967-07-01), Diekmann
patent: 5216135 (1993-06-01), Urano et al.
patent: 5338641 (1994-08-01), Pawlowski et al.
patent: 5350660 (1994-09-01), Urano et al.
patent: 5424166 (1995-06-01), Pawlowski et al.

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