Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
Inventor
active
Barrier layer and method of depositing a barrier layer
Depositing a tantalum film
No associations
LandOfFree
Hilke Donohue does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Hilke Donohue, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hilke Donohue will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-2826150