4. Optics: measuring and testing
  5. By light interference
  6. For dimensional measurement

Han-Ming Sheng

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Arc coating on mask quartz plate to avoid alignment error on...

Semiconductor device manufacturing: process – With measuring or testing – Optical characteristic sensed
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Damascene method employing multi-layer etch stop layer

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Frame layout to monitor overlay performance of chip composed...

Image analysis – Applications – Manufacturing or product inspection
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Method for accurately calibrating a constant-angle...

Optics: measuring and testing – By light interference – For dimensional measurement
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Overlay matching method which eliminates alignment induced...

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having substrate registration feature
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Profile ID: LFUS-PAI-P-2046289

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