4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Guang-Jye Shiau

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Method for anisotropically etching tungsten using SF.sub.6, CHF.

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent

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Semiconductor process chamber having improved gas distributor

Drying and gas or vapor contact with solids – Material treated by electromagnetic energy – Radio or high-frequency energy
Reexamination Certificate

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Semiconductor process chamber having improved gas distributor

Drying and gas or vapor contact with solids – Material treated by electromagnetic energy – Radio or high-frequency energy
Reexamination Certificate

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System and method to screen defect related reliability...

Static information storage and retrieval – Read/write circuit – Testing
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1248367

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