4. Metal working
  5. Barrier layer or semiconductor device making

Gerald W. Iseler

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Apparatus for forming nanometric features on surfaces

Metal working – Barrier layer or semiconductor device making
Patent

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Forming metal nitrides

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
Reexamination Certificate

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Growth of uniform crystals

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Havin growth from molten state
Reexamination Certificate

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Method and apparatus for forming nanometric features on surfaces

Electricity: motive power systems – Positional servo systems – Program- or pattern-controlled systems
Patent

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Telescoping low vibration pulling mechanism for Czochralski crys

Rotary shafts – gudgeons – housings – and flexible couplings for ro – Coupling facilitates relative axial motion between coupled...
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Profile ID: LFUS-PAI-P-610356

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