4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Ernst Hendrik August Granneman

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Apparatus for supporting a semiconductor wafer during...

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Apparatus for transferring wafer and ring

Material or article handling – Chamber of a type utilized for a heating function and... – Including driven device and/or inclined flow path to carry...
Reexamination Certificate

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Apparatus, method and system for the treatment of a wafer

Drying and gas or vapor contact with solids – Process – With nondrying treating of material
Reexamination Certificate

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Apparatus, method and system for the treatment of a wafer

Drying and gas or vapor contact with solids – Process – With nondrying treating of material
Reexamination Certificate

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Device for processing semiconductor wafers

Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2080976

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