4. Radiant energy
  5. Irradiation of objects or material
  6. Irradiation of semiconductor devices

Erazm M. Omeljanovsky

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Method and apparatus for fabricating a device/circuit pattern by

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
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Soft x-ray submicron lithography using multiply charged ions

X-ray or gamma ray systems or devices – Specific application – Lithography
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Profile ID: LFUS-PAI-P-812412

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