4. Semiconductor device manufacturing: process
  5. Introduction of conductivity modifying dopant into...
  6. Ion implantation of dopant into semiconductor region

Dong-Jin Byun

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Method of forming nitride semiconductor and electronic...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Pretreatment method for a substrate surface using ion beam radia

Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dong-Jin Byun does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Dong-Jin Byun, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dong-Jin Byun will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-2270578

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure