4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Dennis C. Fenske

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Plasma enchanced chemical method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Plasma enhanced chemical processing reactor

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Plasma enhanced chemical processing reactor and method

Coating apparatus – Gas or vapor deposition – With treating means
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Plasma enhanced chemical processing reactor and method

Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dennis C. Fenske does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Dennis C. Fenske, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dennis C. Fenske will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-607364

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure