4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Etching a multiple layered substrate where the etching...

Daniel G. Stearns

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Compensation of flare-induced CD changes EUVL

Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate

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EUV lithography reticles fabricated without the use of a...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Fluorescent light tomography

Surgery – Diagnostic testing – Detecting nuclear – electromagnetic – or ultrasonic radiation
Reexamination Certificate

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Fluorescent light tomography

Surgery – Diagnostic testing – Detecting nuclear – electromagnetic – or ultrasonic radiation
Reexamination Certificate

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Giant magnetoresistive sensor

Dynamic magnetic information storage or retrieval – Head – Hall effect
Patent

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Profile ID: LFUS-PAI-P-371287

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