4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Daiziro Kudo

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Apparatus for plasma treatment of semiconductor materials

Coating apparatus – Gas or vapor deposition – Work support
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Process for the vapor growth of a thin film

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
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Profile ID: LFUS-PAI-P-676972

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