Semiconductor device manufacturing: process
Semiconductor substrate dicing
Having specified scribe region structure
Inventor
active
Active region corner implantation method for fabricating a...
CMOS on SOI substrates with hybrid crystal orientations
Formation of a thin oxide protection layer at poly sidewall and
Formation of shallow trench isolation (STI)
Formation of thin spacer at corner of shallow trench isolation (
No associations
LandOfFree
Chung-Te Lin does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Chung-Te Lin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chung-Te Lin will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-450560