Ching-Tien Ma

Inventor

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

IMD film composition for dual damascene process

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Inter-metal dielectric film composition for dual damascene...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Method for dual-damascene formation using a via plug

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Method for eliminating loading effect using a via plug

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Method for forming via and contact holes with deep UV...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Processing feature prior to imaging
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ching-Tien Ma does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Ching-Tien Ma, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ching-Tien Ma will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-2129184

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.