4. Semiconductor device manufacturing: process
  5. Including control responsive to sensed condition
  6. Optical characteristic sensed

Brian P. Conchieri

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Apparatus and system for eliminating contaminants on a...

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Effective channel length control using ion implant feed forward

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
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Effective channel length control using ion implant feed forward

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
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Part number inhibit control

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
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Treatment to eliminate polysilicon defects induced by...

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
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Profile ID: LFUS-PAI-P-2552257

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