Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate
2005-02-15
2005-02-15
Barr, Michael (Department: 1746)
Coating apparatus
Gas or vapor deposition
Multizone chamber
C118S715000, C118S724000
Reexamination Certificate
active
06855207
ABSTRACT:
An intergrated closed apparatus and system for eliminating contaminants including metallic and/or hydrocarbon-containing contaminants on a surface of a semiconductor substrate. The apparatus and system include a heating chamber for heating the contaminated substrate to an elevated temperature, and an input line for purging the chamber with a chlorine-containing gas. The chlorine dissociates from the chlorine-containing gas, reacts with the contaminates, and forms volatile chloride byproducts which are removed from the heating chamber via an output line. A cooling chamber of the apparatus and system having an input line for providing a gas therein cools the substrate. A workpiece holds the substrate, which in turn, is held in position by a pedestal. The pedestal is in contact with a door that seals the closed apparatus and system, whereby the door transfers the substrate from the heating chamber to the cooling chamber, and vice versa.
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Conchieri Brian P.
Dussault David D.
Ishaq Mousa H.
Barr Michael
Chaudhry Saeed
DeLio & Peterson LLC
Reynolds Kelly M.
Sabo William D.
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