4. Coating apparatus
  5. Program, cyclic, or time control

Bernward Gohla

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System for producing semiconductor layer structures by way of ep

Coating apparatus – Program – cyclic – or time control
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System for producing semicondutor layer structures by way of epi

Coating apparatus – Gas or vapor deposition – Multizone chamber
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Profile ID: LFUS-PAI-P-686495

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