4. Cleaning and liquid contact with solids
  5. Processes
  6. Hollow work, internal surface treatment

Bernd Kutsch

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Device and method for anisotropic plasma etching of a...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Device and method for anisotropic plasma etching of a...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method of avoiding or eliminating deposits in the exhaust...

Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment
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Profile ID: LFUS-PAI-P-2820129

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