Method of avoiding or eliminating deposits in the exhaust...

Details Method of avoiding or eliminating deposits in the exhaust... Method of avoiding or eliminating deposits in the exhaust...

2005-04-05

2005-04-05

Goudreau, George A. (Department: 1763)

Cleaning and liquid contact with solids

Processes

Hollow work, internal surface treatment

C134S001100, C216S067000, C438S714000, C438S734000

Reexamination Certificate

active

06874511

ABSTRACT:
Method of avoiding or eliminating deposits in the exhaust area of a vacuum system in which a gas containing depositable constituents in the exhaust area is at least intermittently pumped out of a vacuum chamber that is connected to a vacuum pump via a gas line. A reactive gas that removes deposits from the gas in the vacuum pump and/or units provided downstream therefrom, and/or reduces or eliminates existing deposits in this area is at least intermittently added to the gas directly upstream from or within the vacuum pump. The proposed method is particularly suitable for anisotropic plasma etching of silicon using alternating etching steps and polymerization steps, the vacuum chamber being supplied with a sulfur-containing etching gas during the etching steps and a polymerizing agent-containing gas during the polymerization steps.

REFERENCES:
patent: 4556584 (1985-12-01), Sarkozy
patent: 4647338 (1987-03-01), Visser
patent: 4655800 (1987-04-01), Tsukada et al.
patent: 5051060 (1991-09-01), Fleischmann et al.
patent: 5501893 (1996-03-01), Laermer et al.
patent: 5819683 (1998-10-01), Ikeda et al.
patent: 6238588 (2001-05-01), Collins et al.
patent: 6531068 (2003-03-01), Laermer et al.
patent: 34 32 033 (1985-03-01), None
patent: 42 41 045 (1994-05-01), None
patent: 198 26 382 (1999-12-01), None
patent: 61-178026 (1986-08-01), None
patent: 8-299784 (1996-11-01), None
patent: 09-279351 (1997-10-01), None
patent: 2001-189277 (2001-07-01), None

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