4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Bao-Ru Yang

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Method for polymer removal after etching

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Substrate isolation process to minimize junction leakage

Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Recessed oxide by localized oxidation
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Profile ID: LFUS-PAI-P-1656367

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