4. Electrical transmission or interconnection systems
  5. Nonlinear reactor systems
  6. Parametrons

Atsushi Ozaki

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Apparatus for adjusting initial position of melt surface

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Including specific material of construction
Patent

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Apparatus for adjusting initial position of melt surface

Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus – With means for measuring – testing – or sensing
Patent

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Apparatus for measuring crystal diameter

Radiant energy – Photocells; circuits and apparatus – Optical or pre-photocell system
Patent

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Ceramic substrate for manufacture/inspection of semiconductor

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – Insulating material
Reexamination Certificate

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Conical portion growth control method and apparatus

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent

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Profile ID: LFUS-PAI-P-131567

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