4. X-ray or gamma ray systems or devices
  5. Specific application
  6. Lithography

Alek C. Chen

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In situ proximity gap monitor for lithography

Optics: measuring and testing – Dimension
Reexamination Certificate

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Magnification correction for 1-X proximity X-Ray lithography

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Profile ID: LFUS-PAI-P-1800736

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