Heating
Work feeding, agitating, discharging or conveying...
Removable furnace bottom section or kiln cart
Inventor
active
Apparatus for treating wafers, provided with a sensor box
Chemical vapor deposition of TiN films in a batch reactor
Deposition of TiN films in a batch reactor
Device for processing semiconductor wafers
In situ silicon and titanium nitride deposition
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Profile ID: LFUS-PAI-P-506869