Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2007-12-26
2009-12-01
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C716S030000
Reexamination Certificate
active
07625678
ABSTRACT:
The photomask of this invention includes, on a transparent substrate, a semi-shielding portion having a transmitting property against exposing light, a transparent portion having a transmitting property against the exposing light and surrounded with the semi-shielding portion, and an auxiliary pattern surrounded with the semi-shielding portion and provided around the transparent portion. The semi-shielding portion and the transparent portion transmit the exposing light in an identical phase with respect to each other. The auxiliary pattern transmits the exposing light in an opposite phase with respect to the semi-shielding portion and the transparent portion and is not transferred through exposure.
REFERENCES:
patent: 5478678 (1995-12-01), Yang et al.
patent: 6728946 (2004-04-01), Schellenberg et al.
patent: 7060398 (2006-06-01), Misaka
patent: 2003/0027366 (2003-02-01), Dulman et al.
patent: 2003/0203290 (2003-10-01), Misaka
patent: 2003/0203291 (2003-10-01), Misaka
patent: 2004/0121244 (2004-06-01), Misaka
patent: 5-165194 (1993-06-01), None
patent: 9-269590 (1997-10-01), None
patent: 10-48806 (1998-02-01), None
patent: 11-143047 (1999-05-01), None
patent: 2000-19710 (2000-01-01), None
patent: 2003-203290 (2003-10-01), None
patent: 2003-203291 (2003-10-01), None
patent: 2004-121244 (2004-06-01), None
McDermott Will & Emery LLP
Panasonic Corporation
Rosasco Stephen
LandOfFree
Mask data creation method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Mask data creation method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask data creation method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4102832