4. Semiconductor device manufacturing: process
  5. Coating with electrically or thermally conductive material
  6. Insulated gate formation

Ajit Paranjpe

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Dual collimated deposition apparatus and method of use

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

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Dual collimated deposition apparatus and method of use

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

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Poly-silicon-germanium gate stack and method for forming the...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Reexamination Certificate

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Poly-silicon-germanium gate stack and method for forming the...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Reexamination Certificate

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Process sequence for doped silicon fill of deep trenches

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
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Profile ID: LFUS-PAI-P-2363345

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