4. Semiconductor device manufacturing: process
  5. Chemical etching

Robert A. Soper

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Correcting a mask pattern using a clip mask

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Correcting a mask pattern using multiple correction grids

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Double pattern and etch of poly with hard mask

Semiconductor device manufacturing: process – Chemical etching
Reexamination Certificate

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Method and system for mask pattern correction

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2688146

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