Water slide for transferring semiconductor wafers

Details Water slide for transferring semiconductor wafers Water slide for transferring semiconductor wafers

1997-08-29

2000-04-25

Ellis, Christopher P.

Conveyors: fluid current

Having means for maintaining load in suspension along flow path

406 88, 406 89, 406 90, B65G 5316

Patent

active

060536683

ABSTRACT:
A water slide for semiconductor wafer processing minimizes water usage by confining water to flow within spaced-apart grooves in the absence of a wafer. When a wafer passes down the water slide, a meniscus of water formed above the grooves is spread out to occupy the space underneath the wafer and prevent it from contacting the water slide as the wafer travels down the water slide.

REFERENCES:
patent: 4015880 (1977-04-01), Colvin et al.

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