Process for the vapor deposition of polysilanes photoresists

Details Process for the vapor deposition of polysilanes photoresists Process for the vapor deposition of polysilanes photoresists

1991-01-02

1992-12-22

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437225, 437228, 148DIG137, 430270, H01L 2100, H01L 2102, G03F 710

Patent

active

051734524

ABSTRACT:
Disclosed is a process for forming a film comprising a polysilane composition on a substrate. The film is formed by vapor deposition directly on a substrate, thus avoiding the cumbersome steps ordinarily encountered in preparing and applying polysilanes by conventional spin application techniques. The film is used in a lithographic process for forming an image on a substrate.

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West, R., "Polysilane High Polymers and Their Technological Applications", Actual. Chim., (3), 1986, pp. 64-70.

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