Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1999-10-28
2000-12-05
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430910, G03F 7004
Patent
active
061564818
ABSTRACT:
A hydroxystyrene-(meth)acrylate copolymer in which some phenolic hydroxyl groups are crosslinked with acid labile groups is blended as a base resin in a positive resist composition, which has the advantages of enhanced dissolution inhibition and an increased dissolution contrast after exposure.
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Hatakeyama Jun
Ishihara Toshinobu
Ohsawa Youichi
Takeda Takanobu
Watanabe Jun
Ashton Rosemary
Baxter Janet
Shin-Etsu Chemical Co. , Ltd.
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