Low pressure growth of cubic boron nitride films

Details Low pressure growth of cubic boron nitride films Low pressure growth of cubic boron nitride films

1995-10-03

1997-01-28

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427571, 427577, 427249, 4272557, 427299, 427309, 51307, B05D 306, C23C 1600

Patent

active

055976255

ABSTRACT:
A method for forming thin films of cubic boron nitride on substrates at low pressures and temperatures. A substrate is first coated with polycrystalline diamond to provide a uniform surface upon which cubic boron nitride can be deposited by chemical vapor deposition.
The cubic boron nitride film is useful as a substitute for diamond coatings for a variety of applications in which diamond is not suitable. any tetragonal or hexagonal boron nitride.
The cubic boron nitride produced in accordance with the preceding example is particularly well-suited for use as a coating for ultra hard tool bits and abrasives, especially those intended to use in cutting or otherwise fabricating iron.

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Santhanam, A. T. et al., "Cemented Carbides", pp. 950-977. No publication date!
Matsumoto, S. et al., "Vapor Deposition of Diamond Particles from Methane", Japanese Journal of Applied Physics, vol. 21, No. 4, Apr. 1982, pp. L183-L185.
Paisley, M. J., et al., "Cubic Boron Nitride Thin Film Synthesis by Microwave ECR Plasma Chemical Vapor Deposition," Kobe Engineering Reports, Sep. 20, 1991.

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