Method and apparatus for coating dielectrics

Details Method and apparatus for coating dielectrics Method and apparatus for coating dielectrics

1995-04-24

1997-01-28

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

118 50, 118723MP, 118723MW, 118723VE, 4272481, 427294, 427585, H05H 130

Patent

active

055976247

ABSTRACT:
A method of fabrication of preforms for manufacturing of optical fibers based on surface plasma wave chemical vapor deposition (CVD) is proposed. A surface plasma wave of either the symmetric E.sub.01 or the hybrid HE.sub.11 type is excited on the outside surface of a dielectric starting body. The plasma leads to a CVD of doped or undoped silica layers to obtain the preform. The advantages of the method are the absence of any moving parts in the machinery, high deposition rates, minimal precursor gas usage. Equipment to carry out this process is described as well.

REFERENCES:
patent: 4714589 (1987-12-01), Auwerda et al.
patent: 4944244 (1990-07-01), Moisan et al.

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