Method of depositing a coating containing silicon and oxygen

Details Method of depositing a coating containing silicon and oxygen Method of depositing a coating containing silicon and oxygen

1991-05-28

1992-11-24

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427 58, 4272553, 4272557, 427402, 427577, 427578, B05D 306

Patent

active

051659557

ABSTRACT:
The present invention relates to the deposition of coatings containing silicon and oxygen from vaporized hydrogen silsesquioxane resin. The process comprises introducing the hydrogen silsesquioxane vapor into a deposition chamber containing the substrate to be coated and then inducing reaction of the vapor to form the coating.

REFERENCES:
patent: 3615272 (1971-10-01), Collins et al.
patent: 4756977 (1988-07-01), Haluska et al.

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