Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type
Patent
1994-03-17
1996-03-26
Anderson, Bruce C.
Radiant energy
Inspection of solids or liquids by charged particles
Electron probe type
250307, 250397, H01J 3726
Patent
active
055023061
ABSTRACT:
There is disclosed numerous embodiments of a method and apparatus for a particle scanning system and an automatic inspection system. In each of these a particle beam is directed at the surface of a substrate for scanning that substrate. Also included are a selection of detectors to detect at least one of the secondary particles, back-scattered particles and transmitted particles from the substrate. The substrate is mounted on an x-y stage to provide it with at least one degree of freedom while the substrate is being scanned by the/particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary particles. The system also has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment means for initially aligning the substrate beneath the,particle beam means. To function most efficiently there is also a vacuum means for evacuating and repressurizing a chamber containing the substrate. The vacuum means can be used to hold one substrate at vacuum while a second one is being loaded/unloaded, evacuated or repressurized. Alternately, the vacuum means can simultaneously evacuate a plurality of substrates prior to inspection and repressurize of the same plurality of substrates following inspection. In the inspection configuration, there is also a comparison means for comparing the pattern on the substrate with a second pattern.
REFERENCES:
patent: 3795809 (1974-03-01), Takashima
patent: 3809899 (1974-05-01), Baker et al.
patent: 4247203 (1981-01-01), Levy et al.
patent: 4362942 (1982-12-01), Yasuda
patent: 4438332 (1984-03-01), Lichtenegger
patent: 4503329 (1985-03-01), Yamaguchi et al.
patent: 4508968 (1985-04-01), Kobayashi et al.
patent: 4609809 (1986-09-01), Yamaguchi et al.
patent: 4618938 (1986-10-01), Sandland et al.
patent: 4644172 (1987-02-01), Sandland et al.
patent: 4658138 (1987-04-01), Koike et al.
patent: 4665315 (1987-05-01), Bacchetti et al.
patent: 4714833 (1987-12-01), Rose et al.
patent: 4769543 (1988-09-01), Plies
patent: 4805123 (1989-02-01), Specht et al.
patent: 4812651 (1989-03-01), Feuerbaum
patent: 4814615 (1989-03-01), Fushimi et al.
patent: 4818885 (1989-04-01), Davis et al.
patent: 4831266 (1989-05-01), Froslen et al.
patent: 4871911 (1989-10-01), Van Gorkom et al.
patent: 4896036 (1990-01-01), Rose et al.
patent: 4924104 (1990-05-01), Stengl et al.
patent: 4926489 (1990-05-01), Danielson et al.
patent: 4933565 (1990-06-01), Yamaguchi et al.
patent: 4939364 (1990-07-01), Ishitani et al.
patent: 4954705 (1990-09-01), Brunner et al.
patent: 5118941 (1992-06-01), Larson
patent: 5122663 (1992-06-01), Chang et al.
Herriott et al., EBES: A Practical Electron Lithography System, IEEE Transactions on Electron Devices, vol. ED-22, No. 6, Jul. 1975, pp. 385-391.
Koshishiba et al., Pattern Inspection of X-Ray Mask Ulsing Scanning Transmission Electron Microscope, Japan Journal of Applied Physics, Issue 12, 1989, pp. 1765-1774.
Kato et al., Sub-Micron Pattern Inspection System Using Electron Beam, SPIE, vol. 632 Electron-Beam, X-Ray, Ion-Beam Techniques for Submicrometer Lithographies V (1986), pp. 203-209.
Takeuchi et al., Electron-Beam Inspection Technology for X-Ray Masks, F. Vac. Sci. Technol. B, vol. 6, No. 1, Jan./Feb. 1988.
Goto et al., In-Lens Deflections System with Nonequisectored-Type Multiple Electrostatic, J. Vac. Sci. Technol., B1 (4), Oct.-Dec. 1983, pp. 1289-1292.
Idosawa et al., Numerical Considerations on Multipole-Type Electrostatic Deflectors, J. Vac. Sci. Technol., B1 (4), Oct.-Dec. 1983, pp. 1322-1326.
W. H. J. Andersen, Optimum Adjustment and Correction of the Wien Filter, Brit. J. Appl. Phys., 1967, vol. 18. Printed in Great Britain, pp. 1573-1579.
G. H. Curtis, et al., A Wien Filter for Use as an Energy Analyzer with an Electron Microscope, The Review of Scientific Instruments, vol. 42, No. 5, May 1971, pp. 630-637.
Becker Barry
Bhaskar Chetana
Brodie Alan D.
Chadwick Curt
Clark David J.
Anderson Bruce C.
Jones Allston L.
KLA Instruments Corporation
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