Apparatus and method for discharging a specimen disposed in an e

Details Apparatus and method for discharging a specimen disposed in an e Apparatus and method for discharging a specimen disposed in an e

1991-07-11

1992-10-27

Berman, Jack I.

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

250306, 250309, 250311, 361213, H01J 3726

Patent

active

051591960

ABSTRACT:
In order to be able to investigate non-conductive specimens in an electron beam apparatus in a charge-neutral manner, a charge applied by the scanning electron beam is neutralized with the assistance of charge carriers present in a metal plasma. The plasma is generated by a gas discharge between two electrodes positioned with the vacuum specimen chamber of the electron beam apparatus. One of these electrodes has a layered structure (e.g. metal-insulator-metal) that facilitates the ignition of the gas discharge by means of a high-voltage pulse.

REFERENCES:
patent: 4249077 (1981-02-01), Crawford
"Wafer Decharging During Electron-Beam Exposure", IBM Technical Disclosure Bulletin, vol. 27, No. 11, Apr., 1985, pp. 6388-6389.
"Oscillatory Scattered Ion Yields From Nonconductive Materials", by D. L. Christensen et al., Nuclear Instruments and Methods 149 (1978), pp. 587-589.
"Charge neutralisation of insulating surfaces in the SEM by gas ionisation", J. Phys. D: Appl. Phys., vol. 11, 1978, pp. 2315-2325.

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