Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1996-08-29
1998-11-17
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430170, 430905, 430910, G03F 7004
Patent
active
058374191
ABSTRACT:
A photosensitive composition contains an acid-decomposable resin, a photo-acid-generating agent, and a naphthol novolak compound with a molecular weight of 2000 or less. The acid-decomposable resin is preferably a copolymer consisting of a polymerizable compound having an alicyclic skeleton as a monomer.
REFERENCES:
patent: 4404357 (1983-09-01), Taylor et al.
patent: 4551409 (1985-11-01), Gulla et al.
patent: 4725523 (1988-02-01), Miura et al.
patent: 4963463 (1990-10-01), Koshiba et al.
patent: 5023164 (1991-06-01), Brunsvold et al.
patent: 5118582 (1992-06-01), Ueno et al.
patent: 5275910 (1994-01-01), Moriuma et al.
patent: 5280599 (1994-01-01), Arai
patent: 5292614 (1994-03-01), Ochiai et al.
patent: 5360696 (1994-11-01), Hanamoto et al.
patent: 5376498 (1994-12-01), Kajita et al.
patent: 5391465 (1995-02-01), Feely
patent: 5478680 (1995-12-01), Hishiro et al.
patent: 5529885 (1996-06-01), Ochiai et al.
Asakawa Koji
Nakase Makoto
Okino Takeshi
Shida Naomi
Ushirogouchi Toru
Chu John S.
Kabushiki Kaisha Toshiba
LandOfFree
Photosensitive composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-882608