Method of manufacturing thin film transistor

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

148DIG100, 156650, 156652, 156655, 1566611, 437245, H01L 21306, C23F 102

Patent

active

046844350

ABSTRACT:
An improved process for manufacturing a thin film transistor uses two masks for etching and therefore one mask alignment. The technical effect of said process is to provide the thin film transistor with low cost and enhanced yield.

REFERENCES:
patent: 3904461 (1975-09-01), Estep
patent: 4358748 (1982-11-01), Gruner
patent: 4404731 (1983-09-01), Poleshuk
patent: 4428796 (1984-01-01), Milgram
patent: 4502917 (1985-03-01), Chamberlin
patent: 4624737 (1986-11-01), Shimbo

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