Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1985-08-06
1988-01-05
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430287, 430 18, 430910, 522 96, 525293, G03C 171, C08F26502
Patent
active
047176431
ABSTRACT:
Disclosed are dry film solder mask compositions containing a binder material that is the reaction product of: (a) a polymerized mixture of polypropyleneglycol monomethacrylate, methacrylic acid and, preferably, specific acrylates and methacrylates; and (b) isocyanatoethyl methacrylate. The masks are equal or superior to current dry film masks in affording protection to circuit boards.
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patent: 4333963 (1982-06-01), Emmons et al.
patent: 4515887 (1985-05-01), Davis
Brungardt Clement L.
Scheve Bernard J.
Hamilton Cynthia
Hercules Incorporated
Luther John P.
Michl Paul R.
Player William E.
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