Method for deposition of hard carbon film

Details Method for deposition of hard carbon film Method for deposition of hard carbon film

1987-05-20

1989-07-04

Nguyen, Nam X.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, 204298, C23C 1446

Patent

active

048447854

ABSTRACT:
A diamond-like hard carbon film is formed on a substrate by impinging particles of carbon onto a surface of the substrate, bombarding the surface of the substrate with accelerated particles of inert gas or particles of carbon together with hydrogen in a direction not more than 10 degrees out of parallel to the surface so that the particles of carbon aggregate on the surface, at room temperature.

REFERENCES:
patent: 3317354 (1967-05-01), Darrow et al.
patent: 3714334 (1973-01-01), Vickery
patent: 3890430 (1975-06-01), Bakul et al.
patent: 3961103 (1976-06-01), Aisenberg
patent: 4060660 (1977-11-01), Carlson et al.
patent: 4228142 (1980-10-01), Holcombe, Jr. et al.
patent: 4256780 (1981-03-01), Gaerttner et al.
patent: 4425315 (1984-01-01), Tsuji et al.
patent: 4434188 (1984-02-01), Kamo et al.
patent: 4486286 (1984-12-01), Lewin et al.
patent: 4490229 (1984-12-01), Mirtich et al.
C. Neissmantell et al., "Preparation and Properties of Hard i-c and i-BN Coatings", Thin Solid Films, 96 (1982), pp. 31-44.
L. Holland et al., "The Growth . . . Plasma", Thin Solid Films, 58 (1979), pp. 107-116.
G. Gautherin et al., "Some Trends . . . Methods", Thin Solid Films, 50 (1978), pp. 135-144.
Kitabatake et al., "Growth of Diamond at Room Temperature by an Ion-Sputter Deposition Under Hydrogen-Ion Bombardment", Journal of Applied Physics 58 (4), Aug. 15, 1985, pp. 1693-1695.

Affiliated with

Also associated with

Rating

Method for deposition of hard carbon film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for deposition of hard carbon film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for deposition of hard carbon film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-850601