Method for manufacturing phase-shifting mask

Details Method for manufacturing phase-shifting mask Method for manufacturing phase-shifting mask

Filed on

1997-04-22

Date issued

1999-08-03

Examiner

Wilczewski, Mary

Patent Class

Semiconductor device manufacturing: process

SubClass

Chemical etching

SubSubClass

Vapor phase etching

Other Related Categories

438942, 438948, 430 5, 430313, 430315, 430322, 430324, 148DIG106, 216 41, 216 48, 216 51, G03F 900, G03F 712

Type

Patent

Status

active

Patent number

059324899

Description

ABSTRACT:
A method for manufacturing phase-shifting masks utilizing a photolithographic process and sidewall spacers to fabricate a phase-shifting layer. The method provides precise control over the shape and size of the resulting phase-shifting layer, and thus, simplifies photomask production.

REFERENCES:
patent: 5268244 (1993-12-01), Yoo
patent: 5288568 (1994-02-01), Cathey, Jr.
patent: 5382483 (1995-01-01), Young
patent: 5455131 (1995-10-01), Kang et al.
patent: 5536606 (1996-07-01), Doan
patent: 5567552 (1996-10-01), Ham
patent: 5591549 (1997-01-01), Yang
patent: 5595843 (1997-01-01), Dao
patent: 5658695 (1997-08-01), Choi

Affiliated with

Also associated with

Rating

Method for manufacturing phase-shifting mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for manufacturing phase-shifting mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing phase-shifting mask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-849096