Exact transmission balanced alternating phase-shifting mask for

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

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430 22, G03F 900

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059323779

ABSTRACT:
A two-step method for eliminating transmission errors in alternating phase-shifting masks is described. Initially, the design data is selectively biased to provide a coarse reduction in the inherent transmission error between features of different phase, size, shape, and/or location. During fabrication of the mask with the modified data, residual transmission errors are then eliminated via the positioning of the edges of the etched-quartz trenches which define the phase of a given feature to a set location beneath the opaque chrome film. Application of feedback, in which the aerial image of the mask is monitored during the positioning of the etched-quartz edges, provides additional and precise control of the residual transmission error.

REFERENCES:
Kostelak, et al, Explosure Characteristics of Alternate Aperture Phase-Shifting Mask Fabricated Using a Subtractive Process J. Vac. Sci, Technol. B (10)6, Nov./Dec. 1992, pp. 3055-3061.
Wong, et al, Mask Topography Effects In Projection Printing of Phase-Shifting Masks IEEE Transactions on Electron Devices, v. 41, No. 6, Jun. 1994, pp. 895-902.
Chieu, et al, Fabrication of Phase Shifting Mask Employing Multi-Layer Films Proceedings SPIE, vol. 2197, 1994, pp. 181-193.
Ferguson, et al, Pattern-Dependent Correction of Mask Topography Effects For Alternating Phase-Shifting Masks Proceedings of SPIE, vol. 2440, 1995, pp. 349-360.

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