Chemically amplified resists

Details Chemically amplified resists Chemically amplified resists

1999-03-09

1999-12-07

Baxter, Janet

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

526313, 4302701, 430905, 430910, C08F 3008, G03C 172

Patent

active

059985577

ABSTRACT:
In general, the invention provides polymers which may be used in chemically amplified resists. More particularly, the invention relates to esterified polymers containing the group: ##STR1## Resist compositions comprise the esterified polymers and photoacid generators.

REFERENCES:
patent: 4780516 (1988-10-01), Foley, Jr.
patent: 5883152 (1999-03-01), Anan et al.
Kotachi et al.; Si-Containing Positive Resists For ArF Excimer Laser Lithography; Journal of Photopolymer Science and Technology; vol. 8, No. 4 (1995); pp. 615-622.

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