Negative-working photosensitive material

Details Negative-working photosensitive material Negative-working photosensitive material

1998-08-10

1999-12-07

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

G03F 711

Patent

active

059980958

ABSTRACT:
A negative-working photosensitive material having formed on a support a photopolymerizable layer containing an addition polymerizable compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator, and a high molecular weight binder and also having formed on the layer a protective layer containing a water-soluble vinyl polymer and a polymer which does not have a compatibility with polyvinyl alcohol and is water soluble in itself.
The protective layer has a practically sufficient adhesive property to the photopolymerizable layer and the photosensitive layer has a high sensitivity to an Ar.sup.+ laser and a TAG-SHG laser and is suitably used as a photosensitive lithographic printing plate.

REFERENCES:
patent: 5597677 (1997-01-01), Kangas

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