Arrangement for detecting secondary and/or backscatter electrons

Details Arrangement for detecting secondary and/or backscatter electrons Arrangement for detecting secondary and/or backscatter electrons

1986-08-11

1987-12-22

Church, Craig E.

Radiant energy

With charged particle beam deflection or focussing

With detector

250310, 250396ML, H01J 37244

Patent

active

047148330

ABSTRACT:
An electron beam apparatus has a primary beam directed onto a point of a specimen to generate emerging secondary electrons that proceed to a detector after traversing an electrical extraction field. The extraction field is provided between electrodes arranged in a plane perpendicular to the optical axis of the electron beam device and a magnetic field is provided perpendicular to the electrical extraction field to compensate for the forces of the extraction field exerted on the primary beam yet to promote extraction of the secondary electrons.

REFERENCES:
H. P. Feuerbaum, "VLSI Testing Using the Electron Probe", Scanning Electron Microscopy, (1979/I), pp. 285-296.

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