Dry etching method

Details Dry etching method Dry etching method

1990-07-20

1992-01-07

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156647, 156653, 156657, 1566591, 156662, 20419237, 252 791, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

050788337

ABSTRACT:
A dry etching process utilizes a gas to form a side wall protecting layer, which gas has added at least chlorine trifluoride, or in the alternative silicon and fluorine as component.

REFERENCES:
patent: 4690729 (1987-09-01), Douglas
patent: 4784720 (1988-11-01), Douglas
patent: 4855017 (1989-08-01), Douglas
patent: 4885054 (1989-12-01), Shibagaki

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