Positively working resist material

Details Positively working resist material Positively working resist material

1986-07-28

1989-06-27

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430191, 430192, 430296, 430326, 522 99, 522148, 525500, 525501, 525504, 525134, B03C 176

Patent

active

048429864

ABSTRACT:
A positively working resist material is disclosed, comprising a compound having at least one silyl ether group and capable of directly dissociating an Si-O-C bond upon irradiation with far ultraviolet rays, X-rays, an electron beam, or an ion beam. The resist material has high sensitivity to high energy radiation, excellent resistance to dry etching, and can be developed with an alkaline aqueous solution.

REFERENCES:
patent: 4208421 (1980-06-01), Bresak et al.
patent: 4491508 (1985-01-01), Olson et al.
patent: 4600685 (1986-07-01), Kitahohji et al.
patent: 4752552 (1988-06-01), Aoai
patent: 4786577 (1988-11-01), Aoai et al.

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