Microlithographic resist containing poly(1,1-dialkylsilazane)

Details Microlithographic resist containing poly(1,1-dialkylsilazane) Microlithographic resist containing poly(1,1-dialkylsilazane)

1987-07-27

1988-09-13

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430272, 430905, 430325, 430326, 522111, 522148, G03C 176

Patent

active

047709740

ABSTRACT:
A resist composition is made resistant to reactive ion etching by admixing therewith a poly(dialkylsilazane).

REFERENCES:
patent: 3911169 (1975-10-01), Lesaicherre et al.
patent: 4451969 (1984-06-01), Chaudhuri
patent: 4599243 (1986-07-01), Sachder et al.
Ueno et al., Preprints of the 4th Technical Conference on Photopolymers, Jul. 11-12, 1985, Tokyo, Japan.

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