Method of patterning a phenolic polymer film without photoactive

Details Method of patterning a phenolic polymer film without photoactive Method of patterning a phenolic polymer film without photoactive

1992-07-31

1994-06-07

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

430309, 430315, 430326, G03F 736, G03F 738

Patent

active

053188705

ABSTRACT:
A phenolic resist without photoadditives achieves enhanced sensitivity when exposed to patterned short wavelength radiation to form a highly crosslinked barrier layer in the exposed regions of the resist surface. The complementary surface regions are silylated in a silicon-containing reagent, and the exposed regions are readily removed by a oxygen RIE plasma. The laser exposure is a reciprocal process allowing precise control. Pattern definition is enhanced by limiting the exposure and the silylation to the surface of the resist.

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