Positive-working radiation-sensitive mixture

Details Positive-working radiation-sensitive mixture Positive-working radiation-sensitive mixture

1983-11-14

1985-03-19

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430271, 430296, 430311, 430275, 430905, 430910, 20415911, 20415914, G03C 168

Patent

active

045060037

ABSTRACT:
A positive-working radiation-sensitive mixture is described which is composed of a compound having at least one C--O--C bond which can be split by acid, a compound which forms a strong acid when irradiated, a binder which is insoluble in water and soluble in aqueous-alkaline solutions, and a resin having solubility properties which differ from those of the binder and which is selected from (1) a polyurethane resin obtained from an organic isocyanate and a polymer which contains hydroxyl groups, (2) a polyvinyl alkyl ether, (3) an alkyl acrylate polymer, or (4) a hydrogenated or partially hydrogenated derivative of colophony. As a result of the resin additives, photoresist layers are obtained which have good adhesion to the support, good flexibility, good latitude in developing and good resolution.

REFERENCES:
patent: 3634082 (1972-01-01), Christensen
patent: 3779778 (1973-12-01), Smith et al.
patent: 3917483 (1975-11-01), Limburg et al.
patent: 4093464 (1978-06-01), Ruckert et al.
patent: 4101323 (1978-07-01), Buhr et al.
patent: 4148654 (1979-04-01), Oddi
patent: 4189320 (1980-02-01), Hsieh
patent: 4189323 (1980-02-01), Buhr

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