Positive photoresist having improved processing properties

Details Positive photoresist having improved processing properties Positive photoresist having improved processing properties

1994-05-27

1995-03-14

Schofer, Joseph L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

522 31, G03C 173

Patent

active

053976800

ABSTRACT:
Polymers having a molecular weight (weight average) M.sub.w from 10.sup.3 to 10.sup.6, comprising recurring structural units of the formulae (I), (IIa) and (IIb) ##STR1## in which R.sub.1 is hydrogen or methyl, Y is a direct bond or a divalent radical of the formula (III) ##STR2## in which Z is a C.sub.1 -C.sub.6 alkylene group bound to the phenyl nucleus,

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Macromolecules, 1989, 22, 21-25 "Photocopolymerization of electron-rich olefins with electron-poor Olefins . . . ".
"Synthesis and polymerization of N-tert-butyloxycabony)maleimide". . . Kwang et al., Feb. 28, 1992.
Chemical Abstracts, vol. 115, 1991 115:170717z "Negative Chemical amplification resist systems based on polyhydroxystyrenes and N-substituted im ides or aldehydes".

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